9 May, 2019
Rohm & Haas Electronic Materials CMP Holdings Inc. (“R&H”), a U.S. company, claimed that the chemical mechanical polishing pad products of NexPlanar Corporation infringed upon R&H’s Taiwan Patent No. 176078, and commenced a patent litigation in the Intellectual Property Court.
On June 2, 2016, the second instance of the IP Court denied R&H’s claims, holding that said R&H’s patent was invalid as it lacked inventive step.
R&H appealed said IP Court’s decision to the Supreme Court. The Supreme Court dismissed on January 14, 2019 R&H’s appeal per its judgment No. 107-Tai-Shang- No. 754. Tsar & Tsai represented NexPlanar Corporation in obtaining the winning judgment in this case.
For further information, please contact:
Ray Hsu, Tsar & Tsai Law Firm
Patent@TsarTsai.com.tw
